Seminario del Dr. Indrat Aria, de la Universidad de Cranfield, titulado “Synergistic CVD graphene and ALD alumina for permeation barrier applications”- A las 13:00hr, en la Sala de Seminarios

Permeation barrier films are critical to a wide range of applications ranging from food and medical packaging to organic electronics and photovoltaics. For some of these applications, not only low permeation values are required but also flexible and transparent. Here, I will present synergistic chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes for scalable manufacturing of few-layer graphene/alumina-based nanolaminates. The resulting ~10 nm thick contiguous film provides an effective encapsulation for organic light-emitting diodes (OLEDs) with measured half-life times of 880 h in ambient.
Short bio
Dr. Indrat Aria is a Lecturer in Manufacturing at Cranfield University, UK. After obtaining his PhD at California Institute of Technology, he held a postdoctoral position at Cambridge University. Dr Aria research interests include the synthesis methods of hierarchical and 3D assemblies of low-dimensional nanomaterials, surface and interface engineering, integration of nano-bulk materials, and ultrathin films and coatings.He is the recipient of the Fulbright fellowship, the Green Talent award and the Wiiliam F. Ballhaus Prize.